快速发现和解决半导体光刻中的Particle污染问题
Using Monitor Reticle and/or In-situ Scanner:
- A particular photolithography tool routinely had excessive particles.
- The in-situ particle scanner would scan monitor reticles going in clean but would intermittently exit with significant amounts of particles of unknown origin.
- The particle contamination was a constant source of frustration and traditional methods of particle detection (built-in, monitor reticles and bench-top particle counters) were unsuccessful in identifying the particle source.
Using ReticleSense®Particle Sensor:
- There are signicant advantages of using the ReticleSense®Particle Sensor (APSRQ) in Photolithographic Scanners for quick particle qualication in Photo Lithography reticle environments.
- With all the necessary alignment and ducial marks, APSRQ can be loaded directly into a scanner just like a reticle and travel the entire reticle path to detect in real-time when and where particles are occurring in scanners.
- APSRQ technology saves the time consuming task of partitioning with multiple surface scan reticles which require the high-value scanner to be brought o‑-line for lengthy particle source troubleshooting.
发表日期: 2017年3月9日
使用传统的光罩控片表面扫描、原地或手持方法，快速识别空气中颗粒的产生时间和地点以及污染源具有挑战性。 此外，由于这些方法缺乏实时反馈，通常“意外”的污染源无法被检测到，或者需要很长时间才能最终识别出来。
